Wafer Ọkọ

Apejuwe kukuru:

Awọn ọkọ oju omi Wafer jẹ awọn paati bọtini ninu ilana iṣelọpọ semikondokito. Semiera ni anfani lati pese awọn ọkọ oju omi wafer ti o jẹ apẹrẹ pataki ati iṣelọpọ fun awọn ilana itankale, eyiti o ṣe ipa pataki ninu iṣelọpọ awọn iyika iṣọpọ giga. A ni ifaramọ ṣinṣin lati pese awọn ọja ti o ga julọ ni awọn idiyele ifigagbaga ati nireti lati di alabaṣepọ igba pipẹ rẹ ni Ilu China.


Alaye ọja

ọja Tags

Awọn anfani

Agbara ifoyina otutu giga
O tayọ Ipata resistance
Ti o dara abrasion resistance
Ga olùsọdipúpọ ti ooru elekitiriki
Lubricity ti ara ẹni, iwuwo kekere
Lile giga
Apẹrẹ ti adani.

HGF (2)
HGF (1)

Awọn ohun elo

-Agba-sooro aaye: bushing, awo, sandblasting nozzle, cyclone lining, lilọ agba, ati be be lo ...
-Iwọn otutu aaye giga: siC Slab, Quenching Furnace Tube, Tube Radiant, crucible, Element Alapapo, Roller, Beam, Heat Exchanger, Tutu Air Pipe, Burner Nozzle, Thermocouple Tube, SiC ọkọ, Kiln ọkọ ayọkẹlẹ Be, Setter, ati be be lo.
-Silicon Carbide Semikondokito: SiC wafer ọkọ, sic chuck,sic paddle, sic kasẹti, sic tan kaakiri tube, wafer orita, afamora awo, guideway, ati be be lo.
Silicon Carbide Seal Field: gbogbo iru oruka lilẹ, gbigbe, bushing, bbl
-Photovoltaic Field: Cantilever Paddle, Lilọ Barrel, Silicon Carbide Roller, ati be be lo.
-Litiumu Batiri Field

WAFER (1)

WAFER (2)

Ti ara Properties Of SiC

Ohun ini Iye Ọna
iwuwo 3,21 g/cc Rin-leefofo ati apa miran
Ooru pato 0,66 J/g °K Pulsed lesa filasi
Agbara Flexural 450 MPa560 MPa 4 ojuami tẹ, RT4 ojuami tẹ, 1300 °
Egugun lile 2,94 MPa m1/2 Microindentation
Lile 2800 Vicker ká, 500g fifuye
Rirọ ModulusYoung ká Modul 450 GPa430 GPA 4 pt tẹ, RT4 pt tẹ, 1300 °C
Iwọn ọkà 2 - 10 µm SEM

Gbona Properties Of SiC

Gbona Conductivity 250 W/m °K Lesa filasi ọna, RT
Imugboroosi Gbona (CTE) 4.5 x 10-6 °K Iwọn otutu yara si 950 °C, silica dilatometer

Imọ paramita

Nkan Ẹyọ Data
RBSiC(SiSiC) NBSiC SSiC RSiC OSiC
SiC akoonu % 85 75 99 99.9 ≥99
Akoonu ohun alumọni ọfẹ % 15 0 0 0 0
Iwọn otutu iṣẹ ti o pọju 1380 1450 1650 Ọdun 1620 1400
iwuwo g/cm3 3.02 2.75-2.85 3.08-3.16 2.65-2.75 2.75-2.85
Ṣii porosity % 0 13-15 0 15-18 7-8
Agbara atunse 20℃ Мpa 250 160 380 100 /
Agbara atunse 1200 ℃ Мpa 280 180 400 120 /
Modulu ti rirọ 20 ℃ Gpa 330 580 420 240 /
Modulu ti rirọ 1200 ℃ Gpa 300 / / 200 /
Ooru elekitiriki 1200 ℃ W/mK 45 19.6 100-120 36.6 /
olùsọdipúpọ ti gbona imugboroosi K-1X10-6 4.5 4.7 4.1 4.69 /
HV Kg/mm2 2115 / 2800 / /

Awọn ohun alumọni ohun alumọni CVD ti a bo lori awọn lode dada ti recrystallized ohun alumọni carbide seramiki awọn ọja le de ọdọ kan ti nw ti diẹ ẹ sii ju 99.9999% lati pade awọn aini ti awọn onibara ninu awọn semikondokito ile ise.

Semicera Work ibi
Ibi iṣẹ Semicera 2
Ẹrọ ẹrọ
CNN processing, kemikali ninu, CVD bo
Iṣẹ wa

  • Ti tẹlẹ:
  • Itele: